Materials - Photovoltaic structures based on ZnO nanorods
and thin films

Photovoltaic structures based on ZnO nanorods
and thin films

 

Description

We developed a new version of a hydrothermal method enabling production of ZnO nanorods on various substrates for applications in photovoltaics. This method enables construction of simple and efficient (about 12 %) solar cells, based on a cheap Si substrate or organic materials covered with nanorods and then ZnO, ZnO:Al films. The latter films are deposited by the Atomic Layer Deposition (ALD) method.

 

Specification

  • Growth temperature: below 300 °C
  • The maximum size of the substrate: 20 cm diameter
  • ZnO film thickness : up to 800 nm
  • ZnO electrical parameters:

                   n=1.6x1019 cm-3

                   ρ=1.8x10-2 Ωcm

  • ZnO:Al film thickness : 300 nm
  • ZnO:Al electrical parameters:

                   n=3.6x1020 cm-3

                   ρ=1.2x10-3 Ωcm

  • Uniform coverage of three-dimensional surface (nanorods)
  • Growth controll in the nanometer scale

 

Schematic drawings of the investigated solar cells structures based on zinc oxide nanorods.

Light current-voltage characteristics for the ZnO:Al/ZnO/ZnONR/Si/Al heterostructures.

Spectral response of the invastigeted PV structure based on zinc oxide nanorods.