Materials - Photovoltaic structures based on ZnO nanorods
and thin films
Photovoltaic structures based on ZnO nanorods and thin films
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DescriptionWe developed a new version of a hydrothermal method enabling production of ZnO nanorods on various substrates for applications in photovoltaics. This method enables construction of simple and efficient (about 12 %) solar cells, based on a cheap Si substrate or organic materials covered with nanorods and then ZnO, ZnO:Al films. The latter films are deposited by the Atomic Layer Deposition (ALD) method. Specification- Growth temperature: below 300 °C
- The maximum size of the substrate: 20 cm diameter
- ZnO film thickness : up to 800 nm
- ZnO electrical parameters:
n=1.6x1019 cm-3 ρ=1.8x10-2 Ωcm - ZnO:Al film thickness : 300 nm
- ZnO:Al electrical parameters:
n=3.6x1020 cm-3 ρ=1.2x10-3 Ωcm - Uniform coverage of three-dimensional surface (nanorods)
- Growth controll in the nanometer scale
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Schematic drawings of the investigated solar cells structures based on zinc oxide nanorods.
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Light current-voltage characteristics for the ZnO:Al/ZnO/ZnONR/Si/Al heterostructures.
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Spectral response of the invastigeted PV structure based on zinc oxide nanorods.
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